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Division Spotlight
Materials Science & Technology
The objectives of MSTD are: promote the advancement of materials science in Nuclear Science Technology; support the multidisciplines which constitute it; encourage research by providing a forum for the presentation, exchange, and documentation of relevant information; promote the interaction and communication among its members; and recognize and reward its members for significant contributions to the field of materials science in nuclear technology.
Meeting Spotlight
2024 ANS Annual Conference
June 16–19, 2024
Las Vegas, NV|Mandalay Bay Resort and Casino
Standards Program
The Standards Committee is responsible for the development and maintenance of voluntary consensus standards that address the design, analysis, and operation of components, systems, and facilities related to the application of nuclear science and technology. Find out What’s New, check out the Standards Store, or Get Involved today!
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Nuclear Science and Engineering
June 2024
Nuclear Technology
Fusion Science and Technology
Latest News
G7 pledges support for nuclear at Italy meeting
The Group of Seven (G7) recommitted its support for nuclear energy in the countries that opt to use it at a Ministerial Meeting on Climate in Italy last month.
In a statement following the April meeting, the group committed to support multilateral efforts to strengthen the resilience of nuclear supply chains, referencing the goal set by 25 countries during last year’s COP28 climate conference in Dubai to triple global nuclear generating capacity by 2050.
Swanee J. Shin, Leonardus B. Bayu Aji, Alison M. Engwall, John H. Bae, Gregory V. Taylor, Paul B. Mirkarimi, Chantel Aracne-Ruddle, Jack Nguyen, Casey W. N. Kong, Sergei O. Kucheyev
Fusion Science and Technology | Volume 79 | Number 7 | October 2023 | Pages 841-852
Research Article | doi.org/10.1080/15361055.2023.2194238
Articles are hosted by Taylor and Francis Online.
Boron carbide is an attractive ablator for next-generation inertial confinement fusion (ICF) targets. Here we describe several aspects of our ongoing systematic studies of the deposition and processing of B4C coatings for ICF targets. We show that residual compressive stress in films can be reduced and the deposition rate increased by N-doping. We also demonstrate successful Si substrate etching and surface polishing and discuss remaining challenges and offer potential solutions to the buildup of particulates in the deposition chamber during prolonged coating runs, control of nodular growth defects, and lateral nonuniformity of film properties for deposition conditions with relatively low target-to-substrate distances.