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Fusion Science and Technology
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Glass strategy: Hanford’s enhanced waste glass program
The mission of the Department of Energy’s Office of River Protection (ORP) is to complete the safe cleanup of waste resulting from decades of nuclear weapons development. One of the most technologically challenging responsibilities is the safe disposition of approximately 56 million gallons of radioactive waste historically stored in 177 tanks at the Hanford Site in Washington state.
ORP has a clear incentive to reduce the overall mission duration and cost. One pathway is to develop and deploy innovative technical solutions that can advance baseline flow sheets toward higher efficiency operations while reducing identified risks without compromising safety. Vitrification is the baseline process that will convert both high-level and low-level radioactive waste at Hanford into a stable glass waste form for long-term storage and disposal.
Although vitrification is a mature technology, there are key areas where technology can further reduce operational risks, advance baseline processes to maximize waste throughput, and provide the underpinning to enhance operational flexibility; all steps in reducing mission duration and cost.
N. A. P. Kiran Kumar, K. J. Leonard, G. E. Jellison, L. L. Snead
Fusion Science and Technology | Volume 67 | Number 4 | May 2015 | Pages 771-783
Technical Paper | doi.org/10.13182/FST14-875
Articles are hosted by Taylor and Francis Online.
The study presents the high-dose behavior of dielectric mirrors specifically engineered for radiation tolerance. Alternating layers of Al2O3/SiO2 and HfO2/SiO2 were grown on sapphire substrates and exposed to neutron doses of 1 and 4 displacements per atom (dpa) at 458 ± 10 K in the High Flux Isotope Reactor (HFIR). In comparison to previously reported results, these higher doses of 1 and 4 dpa result in a drastic drop in optical reflectance, caused by a failure of the multilayer coating. HfO2/SiO2 mirrors failed completely when exposed to 1 dpa, whereas the reflectance of Al2O3/SiO2 mirrors reduced to 44%, eventually failing at 4 dpa. Transmission electron microscopy (TEM) observation of the Al2O3/SiO2 specimens showed SiO2 layer defects, which increase in size with irradiation dose. The typical size of each defect was ≈8 nm in 1-dpa specimens and ≈42 nm in 4-dpa specimens. Buckling-type delamination of the interface between the substrate and first layer was typically observed in both 1- and 4-dpa HfO2/SiO2 specimens. Composition changes across the layers were measured in high-resolution-scanning–TEM mode using energy dispersive spectroscopy. A significant interdiffusion between the film layers was observed in the Al2O3/SiO2 mirror, although it was less evident in the HfO2/SiO2 system. The ultimate goal of this work is to provide insight into the radiation-induced failure mechanisms of these mirrors.