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A Unique Beryllium Carbide Thin Film: Synthesis, Chemical, and Thermal Characterizations

Yixiang Xie, Richard B. Stephens, Nicholas C. Morosoff, William J. James

Fusion Science and Technology / Volume 38 / Number 3 / November 2000 / Pages 384-390

Technical Paper / Special Issue on Beryllium Technology for Fusion /

Plasma-deposited coatings containing beryllium in excess of 50 atomic percent and oxygen content <5 atomic percent would meet the requirements for the outermost coating, the outer ablator of the multilayered microsphere for inertial confinement fusion (ICF). Films containing a Be2C composite with Be contents as high as 75 atomic percent (O < 2 atomic percent) have been deposited on a variety of substrates via magnetron sputtering of Be into a methane/argon plasma. The elemental composition was controlled by adjusting the methane/Ar flow rate ratio during the deposition process. The films were characterized by Auger electron spectroscopy (AES), X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), neutron diffraction (ND), differential thermal analysis (DTA), and thermogrravimetric analysis (TGA).

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