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Nuclear Nonproliferation Policy
The mission of the Nuclear Nonproliferation Policy Division (NNPD) is to promote the peaceful use of nuclear technology while simultaneously preventing the diversion and misuse of nuclear material and technology through appropriate safeguards and security, and promotion of nuclear nonproliferation policies. To achieve this mission, the objectives of the NNPD are to: Promote policy that discourages the proliferation of nuclear technology and material to inappropriate entities. Provide information to ANS members, the technical community at large, opinion leaders, and decision makers to improve their understanding of nuclear nonproliferation issues. Become a recognized technical resource on nuclear nonproliferation, safeguards, and security issues. Serve as the integration and coordination body for nuclear nonproliferation activities for the ANS. Work cooperatively with other ANS divisions to achieve these objective nonproliferation policies.
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Atlanta, GA|Atlanta Marriott Marquis
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NRC cuts fees by 50 percent for advanced reactor applicants
The Nuclear Regulatory Commission has announced it has amended regulations for the licensing, inspection, special projects, and annual fees it will charge applicants and licensees for fiscal year 2025.
Kenan Ünlü, Dietrich H. Vincent
Nuclear Science and Engineering | Volume 110 | Number 4 | April 1992 | Pages 386-393
Technical Paper | doi.org/10.13182/NSE92-A23912
Articles are hosted by Taylor and Francis Online.
Helium trapping and release are studied for the nickel-rich amorphous alloys Ni75.1 Cr14.0-P10.1C0.08, Ni63.5Zr36.5, and Ni87.7P12.3. Helium-3 is introduced into the samples by implantation at 150-keV energy. The depth distribution of the implanted helium is observed by neutron depth profiling employing the reaction 3He(n, p)3H. Two implantation doses are used: 1 × 1016 and 5 × 1016 3He/cm . Both implantation doses were chosen to be low enough to avoid blistering or flaking of the surface of the samples. The helium release behavior of the samples is studied by taking depth profiles after each annealing stage. At the same time, electron diffraction is used on parallel samples to observe the microstructure of the samples as a function of annealing. The annealing sequence for each material is broken off when electron diffraction indicated the existence of relatively large crystals in a sample. Only a small fraction of the implanted helium is released in most cases, and a clear correlation between helium release and recrystallization can be found in only one case.
