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2025 ANS Winter Conference & Expo
November 9–12, 2025
Washington, DC|Washington Hilton
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Leading the charge: INL’s role in advancing HALEU production
Idaho National Laboratory is playing a key role in helping the U.S. Department of Energy meet near-term needs by recovering HALEU from federal inventories, providing critical support to help lay the foundation for a future commercial HALEU supply chain. INL also supports coordination of broader DOE efforts, from material recovery at the Savannah River Site in South Carolina to commercial enrichment initiatives.
Shunsuke Uchida, Masao Kitamura, Yasunori Matsushima, Koichi Yonezawa, Katsumi Ohsumi, Minoru Miki
Nuclear Science and Engineering | Volume 77 | Number 4 | April 1981 | Pages 496-501
Technical Note | doi.org/10.13182/NSE81-A18963
Articles are hosted by Taylor and Francis Online.
The characterization of radioactive corrosion products deposited on the internal surfaces of recirculation pipes was carried out to determine the deposited amounts and configurations. The test specimens were taken from the auxiliary pipes of the recirculation lines of Shimane Nuclear Power Plant after operation for ∼20 000 effective full-power hours. As a result of characterizing them, it was demonstrated that 60Co, which determined the contact dose rate, was difficult to remove by mechanical washing the amount of 60Co deposited was reduced by more than a factor of 10 by oxalic acid polishing and by a factor of ∼1000 by electro-polishing both the particle size and 60Co specific activity of the deposits removed by the mechanical washing (designated as soft deposits) were the same as those of the crud suspended in the reactor water the 60Co specific activity of the deposits removed by the oxalic acid polishing (designated as hard deposits) was ten times greater than that of the suspended crud. It was inferred that the soft deposits were formed by direct deposition of the suspended crud, and the hard deposits were formed by oxidation of the stainless-steel base metal with 60Co being taken into the oxide layers.