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Decommissioning & Environmental Sciences
The mission of the Decommissioning and Environmental Sciences (DES) Division is to promote the development and use of those skills and technologies associated with the use of nuclear energy and the optimal management and stewardship of the environment, sustainable development, decommissioning, remediation, reutilization, and long-term surveillance and maintenance of nuclear-related installations, and sites. The target audience for this effort is the membership of the Division, the Society, and the public at large.
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ANS Student Conference 2025
April 3–5, 2025
Albuquerque, NM|The University of New Mexico
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The Standards Committee is responsible for the development and maintenance of voluntary consensus standards that address the design, analysis, and operation of components, systems, and facilities related to the application of nuclear science and technology. Find out What’s New, check out the Standards Store, or Get Involved today!
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Fusion Science and Technology
Latest News
DOE releases $56.7M in second round of Palisades loan funding
Energy Secretary Chris Wright announced this week the release of the second part of Holtec’s loan disbursement for the Palisades nuclear plant restart plans in Michigan.
I. O. Usov, V. P. Siller, C. T. Wilson, B. M. Patterson, D. R. Vodnik, B. L. Bennett
Fusion Science and Technology | Volume 79 | Number 7 | October 2023 | Pages 816-822
Research Article | doi.org/10.1080/15361055.2023.2173946
Articles are hosted by Taylor and Francis Online.
There are applications where the deposition of a coating must be applied on the inner surface of a tube part. In this paper, we describe a method for deposition of coatings on a tube inner wall. The coating method is based on ion beam sputtering, which is a well-established technology that enables the precise control of coating composition, thickness, and uniformity. This technique also offers the opportunity to deposit coatings selectively on desired locations using shadow masking. As an example, a study of Au and Al thin films is presented.
