Temperature Scalings in the REPUTE-1 Reversed Field Pinch Plasma

Statistical property of ion and electron temperatures on various plasma parameters has been investigated in REPUTE-1 reversed field pinch (RFP) plasmas. The scalings laws are expressed in terms of the plasma current, loop voltage and line averaged density. Dependence on other parameters seems to be weak. The operational range of density is wide in REPUTE-1, and it is limited by Hugill number H*~1, which is another expression of I_p/N, where I_p is the plasma current and N is the area density. Obtained scaling laws are$T_i\propto {V_{Loop}}^{1.3}\times {\bar{n}}_e^{-0.3},T_e\propto {I_p}^{0.8}\times {\bar{n}}_e^{-0.2},$ where n_e is the line averaged electron density and V_Loop is the loop voltage. The electron temperature has roughly same dependence as other RFP devices. The I_p dependence of ion temperature is not found in REPUTE-1, while some RFP devices demonstrate linear dependence.