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Second round of Launch Pad selections includes eight newcomers
The National Reactor Innovation Center at Idaho National Laboratory has announced 13 project selections across 12 companies for the Nuclear Energy Launch Pad, a Department of Energy–led program that integrates reactor and fuel facility authorization, testing, and deployment support for private nuclear developers.
The Launch Pad emerged from the Reactor Pilot Program and Fuel Line Pilot Program.
According to INL, projects selected include reactor development and nuclear fuel cycle advancements, including fabrication, enrichment, and conversion technologies.
A. F. Tawfic, S. E. Dickson, Y. Kim, W. Mekky
Fusion Science and Technology | Volume 67 | Number 3 | April 2015 | Pages 608-611
Proceedings of TRITIUM 2013 | doi.org/10.13182/FST14-T91
Articles are hosted by Taylor and Francis Online.
Electrically switched ion exchange (ESIX) can be used to separate ionic contaminants from industrial wastewater, including that generated by the nuclear industry. The ESIX method involves sequential application of reduction and oxidation potentials to an ion exchange film to induce the respective loading and unloading of cesium. This technology is superior to conventional methods (e.g electrodialysis reversal or reverse osmosis) as it requires very little energy for ionic separation. In previous studies, ESIX films have demonstrated relatively low ion exchange capacities and limited film stabilities over repeated potential applications. In this study, the methodology for the deposition of electroactive films (nickel hexacyanoferrate) on nickel electrodes was modified to improve the ion exchange capacity for cesium removal using ESIX. Cyclic voltammetry was used to investigate the ion exchange capacity and stability. Scanning electron microscopy (SEM) was used to characterize the modified film surfaces. Additionally, the films were examined for the separation of cesium ions. This modified film preparation technique enhanced the ion exchange capacity and improves the film stability compared to previous methods for the deposition of ESIX films.