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Fusion Energy
This division promotes the development and timely introduction of fusion energy as a sustainable energy source with favorable economic, environmental, and safety attributes. The division cooperates with other organizations on common issues of multidisciplinary fusion science and technology, conducts professional meetings, and disseminates technical information in support of these goals. Members focus on the assessment and resolution of critical developmental issues for practical fusion energy applications.
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June 16–19, 2024
Las Vegas, NV|Mandalay Bay Resort and Casino
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Latest News
X-energy receives federal tax credit for TRISO fuel facility
Advanced reactor company X-energy has been awarded $148.5 million in tax credits under the Inflation Reduction Act for construction of its TRISO-X fuel fabrication facility in Oak Ridge, Tenn.
Baojun Liu, Nazir P. Kherani, Stefan Zukotynski, Armando B. Antoniazzi, Kevin P. Chen
Fusion Science and Technology | Volume 54 | Number 2 | August 2008 | Pages 627-630
Technical Paper | Process Applications | doi.org/10.13182/FST08-A1893
Articles are hosted by Taylor and Francis Online.
We report on a simple and versatile method for the integration of tritium in semiconductor materials. A variety of semiconductor materials are exposed to tritium (T2) gas at pressures of up to 120 bar and temperatures of up to 250 °C. Tritiated materials include hydrogenated amorphous silicon (a-Si:H), crystalline silicon (c-Si), silica and carbon nanotubes (CNT). Deep ultra-violet laser irradiation was used to lock tritium in silica films. Effusion measurements show the presence of stable tritium in silicon, silica and CNTs up to 400 °C. IR absorption spectra show a Si-T stretching mode at 1200 cm-1 indicating the formation of stable Si-T bonds in a-Si:H. SIMS measurements show that the penetration depth of tritium in a-Si:H and c-Si is 150 and 10 nm, respectively; the concentration of tritium locked in a-Si:H and c-Si is 20 and 4 at.%, respectively. In tritiated silica, 248-nm UV laser irradiation locks the permeated tritium at stable chemical bonding sites in the silica lattice. Thermal effusion measurement shows that 0.5 wt.% tritium can be stably immobilized in CNTs. The application of tritiated silicon as a cold electron source is demonstrated.