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Conference Spotlight
2025 ANS Winter Conference & Expo
November 9–12, 2025
Washington, DC|Washington Hilton
Standards Program
The Standards Committee is responsible for the development and maintenance of voluntary consensus standards that address the design, analysis, and operation of components, systems, and facilities related to the application of nuclear science and technology. Find out What’s New, check out the Standards Store, or Get Involved today!
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Fusion Science and Technology
Latest News
PR: American Nuclear Society welcomes Senate confirmation of Ted Garrish as the DOE’s nuclear energy secretary
Washington, D.C. — The American Nuclear Society (ANS) applauds the U.S. Senate's confirmation of Theodore “Ted” Garrish as Assistant Secretary for Nuclear Energy at the U.S. Department of Energy (DOE).
“On behalf of over 11,000 professionals in the fields of nuclear science and technology, the American Nuclear Society congratulates Mr. Garrish on being confirmed by the Senate to once again lead the DOE Office of Nuclear Energy,” said ANS President H.M. "Hash" Hashemian.
H. Xu, K. P. Youngblood, H. Huang, J. J. Wu, K. A. Moreno, A. Nikroo, S. J. Shin, Y. M. Wang, A. V. Hamza
Fusion Science and Technology | Volume 63 | Number 2 | March-April 2013 | Pages 202-207
Technical Paper | Selected papers from 20th Target Fabrication Meeting, May 20-24, 2012, Santa Fe, NM, Guest Editor: Robert C. Cook | doi.org/10.13182/FST13-TFM20-16
Articles are hosted by Taylor and Francis Online.
The point design of beryllium capsules includes three Cu-doped layers in a 160-m-thick beryllium shell to achieve the desired X-ray absorption profile. The beryllium capsules were deposited on glow discharge polymer mandrels using a magnetron sputtering process. Cu diffusion during pyrolysis to remove the mandrels after coating has caused nonuniform distribution of Cu along the azimuthal direction due to inhomogeneous diffusion. This nonuniformity along the azimuthal direction could lead to Rayleigh-Taylor instability during capsule implosion. One of the methods to solve this issue is to incorporate a beryllium oxide diffusion barrier layer at the beryllium-Cu-doped-beryllium layer interfaces. In situ and ex situ beryllium oxide layers have proved to be effective in stopping Cu diffusion. This paper will focus on the approaches we have developed to characterize the in situ and ex situ oxide barrier layer thickness by using a combination of Auger electron spectroscopy profiles and Rutherford backscattering spectrometry measurements.