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Antares achieves zero-power criticality at INL
Leveraging more than $140 million in private capital fundraising, over 322,000 square feet of operational manufacturing space, and multifaceted partnerships with the Departments of Energy and Defense, reactor start-up Antares has become the first company involved in the Reactor Pilot Program to achieve zero-power fueled criticality—a full month ahead of the July 4 deadline set by President Trump’s Executive Order 14301.
This milestone, announced yesterday, was achieved with the company’s Mark-0: a sodium heat-pipe-cooled, TRISO-fueled microreactor. The Mark-0 is a forerunner to the company’s flagship design, which it calls the R1. For Antares, this development represents a key validation of its reactor physics, control systems, and supply chain.
A. B. Putrik, N. S. Klimov, Yu. M. Gasparyan, V. A. Barsuk, V. S. Efimov, V. L. Podkovyrov, A. M. Zhitlukhin, A. D. Yaroshevskaya, D. V. Kovalenko
Fusion Science and Technology | Volume 66 | Number 1 | July-August 2014 | Pages 70-76
Technical Paper | doi.org/10.13182/FST13-748
Articles are hosted by Taylor and Francis Online.
Edge-localized mode (ELM) simulation experiments were held on the quasi-stationary plasma accelerator QSPA-T to study the formation of plasma-facing material (PFM) erosion products. Parameters of the deuterium plasma heat loads in QSPA-T were close to those expected during transient events in ITER. A diagnostic system for measuring the deposition rate of the erosion products with resolution time of 0.02 ms (pulse duration 0.5 ms) was designed. It allowed defining the deposition rate dependence on time and property changes of the deposited film during the pulse. The average deposition rate in QSPA-T under exposures to ultra-short D plasmas was in the range of (0.1 to 100)×1019 at·cm2·s−1, which was much higher than that for stationary processes. It has been found that deuterium concentration in the deposited W films depends on substrate temperature and deposition rate approximately in the same way as for stationary processes. As the substrate temperature and deposition rate increased, the D/W atomic ratio in the W films decreased. For describing the evolution of the D/W ratio with the substrate temperature and the tungsten deposition rate, an empirical equation proposed by De Temmerman and Doerner (J. Nucl. Mater., 2009), but with alternative parameters, has been used.