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Nuclear Nonproliferation Policy
The mission of the Nuclear Nonproliferation Policy Division (NNPD) is to promote the peaceful use of nuclear technology while simultaneously preventing the diversion and misuse of nuclear material and technology through appropriate safeguards and security, and promotion of nuclear nonproliferation policies. To achieve this mission, the objectives of the NNPD are to: Promote policy that discourages the proliferation of nuclear technology and material to inappropriate entities. Provide information to ANS members, the technical community at large, opinion leaders, and decision makers to improve their understanding of nuclear nonproliferation issues. Become a recognized technical resource on nuclear nonproliferation, safeguards, and security issues. Serve as the integration and coordination body for nuclear nonproliferation activities for the ANS. Work cooperatively with other ANS divisions to achieve these objective nonproliferation policies.
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Latest News
Webinar: MC&A and safety in advanced reactors in focus
Towell
Russell
Prasad
The American Nuclear Society’s Nuclear Nonproliferation Policy Division recently hosted a webinar on updating material control and accounting (MC&A) and security regulations for the evolving field of advanced reactors.
Moderator Shikha Prasad (CEO, Srijan LLC) was joined by two presenters, John Russell and Lester Towell, who looked at how regulations that were historically developed for traditional light water reactors will apply to the next generation of nuclear technology and what changes need to be made.
Yong-Sup Choi, HyonJae Park, Taihyeop Lho
Fusion Science and Technology | Volume 63 | Number 1 | May 2013 | Pages 221-224
doi.org/10.13182/FST13-A16910
Articles are hosted by Taylor and Francis Online.
Evaporation properties of FLiNaK (LiF 46.5 mol% + NaF 11.5% + KF 42 mol%) were investigated with hydrogen plasma interaction. To prevent massive evaporation of molten salt of flowing wall in fusion device, evaporation property of molten salt should be researched. However vapor pressure of FLiNaK has been studied for liquid state without consideration of interaction with plasma. We measured evaporation property of FLiNaK with hydrogen plasma interaction. Vapor component of FLiNaK were detected with OES(Optical Emission Spectroscopy) and RGA(Residual Gas Analyzer). The film deposited on wafer samples were investigated with EDS(Energy Dispersive Spectrometer) to determine vapor component. Hydrogen plasma was generated with 500W ECR source and the molten FLiNaK was contained with heated crucible of diameter of 46mm and depth of 40mm. OES data showed several peaks of total component of FLiNaK. Those were emission lines of F, Li, Na and K. RGA data also showed FLiNaK components with plasma interaction. Without plasma interaction, the deposited film was mostly KF at molten salt temperature of 973K. The components of deposited film during plasma interaction were similar with the original FLiNaK sample. The evaporated mass became higher with plasma interaction while the remained FLiNaK at crucible still hold similar molar percentage. In this paper, plasma-enhanced-evaporation of FLiNaK was qualitatively discussed.
