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Glass strategy: Hanford’s enhanced waste glass program
The mission of the Department of Energy’s Office of River Protection (ORP) is to complete the safe cleanup of waste resulting from decades of nuclear weapons development. One of the most technologically challenging responsibilities is the safe disposition of approximately 56 million gallons of radioactive waste historically stored in 177 tanks at the Hanford Site in Washington state.
ORP has a clear incentive to reduce the overall mission duration and cost. One pathway is to develop and deploy innovative technical solutions that can advance baseline flow sheets toward higher efficiency operations while reducing identified risks without compromising safety. Vitrification is the baseline process that will convert both high-level and low-level radioactive waste at Hanford into a stable glass waste form for long-term storage and disposal.
Although vitrification is a mature technology, there are key areas where technology can further reduce operational risks, advance baseline processes to maximize waste throughput, and provide the underpinning to enhance operational flexibility; all steps in reducing mission duration and cost.
Katsushi Matsuoka, Makoto Kobayashi, Rie Kurata, Junya Osuo, Naoko Ashikawa, Akio Sagara, Yasuhisa Oya, Kenji Okuno
Fusion Science and Technology | Volume 60 | Number 1 | July 2011 | Pages 412-416
Materials Development & Plasma-Material Interactions | Proceedings of the Nineteenth Topical Meeting on the Technology of Fusion Energy (TOFE) (Part 1) | doi.org/10.13182/FST11-A12391
Articles are hosted by Taylor and Francis Online.
Impurity effects on chemical behavior of energetic deuterium implanted into the carbon-oxygen containing boron films were investigated as a function of impurity concentrations by means of XPS and TDS. This study was carried out for about 40% impurities-containing boron films. It was found that a major chemical state of carbon was C-B bond and that of oxygen was free oxygen for the carbon-oxygen containing boron films. Most of deuterium was trapped by the C-B bond to form a B-C-D bond. On the other hand, free oxygen formed heavy water (D2O) and released as D2O during deuterium implantation. The amount of deuterium trapped by carbon was increased as the carbon concentration increased. However, the deuterium retention for the carbon-oxygen containing boron film with less than 20% carbon was almost twice as high as that for the only about 20% carbon-containing boron films. It was also indicated that the formation of free carbon was refrained due to the existence of free oxygen which induce the increase of C-B bond in about 40% impurities-containing boron films. These results indicate that hydrogen isotopes were trapped as B-C-D bond, which released deuterium at 900 K, in lower carbon concentration as oxygen coexists with carbon in the boron films. It was concluded that impurity concentration should be kept as low as possible to prevent tritium retention in the boron film deposited on the first wall in future fusion devices.