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Review of In Situ Boronization in Contemporary Tokamaks

Oleg I. Buzhinskij, Yuri M. Semenets

Fusion Science and Technology

Volume 32 / Number 1 / August 1997 / Pages 1-13


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A review of some characteristic features of the boronization process, properties of boron-carbon films, and the influence of these features on tokamak discharges is presented. Boronization, as defined here, is a plasma chemical vapor deposition of a thin a-B/C:H film on the first wall of fusion reactors. As a result of boronization, oxygen, carbon, and heavy impurities (e.g., iron, nickel, and chromium) are suppressed, and hydrogen recycling is reduced, which substantially improves the characteristics of tokamak discharges. A two-stage complex protection of both the first wall by boronization and of limiters, divertor plates, and radio-frequency antennas by the application of thick B4C coatings provides further improvement of tokamak plasma parameters.

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