American Nuclear Society
Home

Home / Publications / Transactions / Volume 116 / Number 1

Deposition of Ti2AlC Thin Film

Ranran Su, Hongliang Zhang, Liqun Shi (Fudan Univ.)

Transactions / Volume 116 / Number 1 / June 2017 / Pages 468-471

Materials Science and Technology

 
Questions or comments about the site? Contact the ANS Webmaster.
advertisement